GovWhitePapers Logo

Sorry, your browser is not compatible with this application. Please use the latest version of Google Chrome, Mozilla Firefox, Microsoft Edge or Safari.

Tracing the Emergence of Extreme Ultraviolet Lithography

Learn more about the case study on the most important technology to have emerged in the past decade: extreme ultraviolet (EUV) lithography. EUV is the latest innovation in a long line of technical accomplishments that have supported the semiconductor industry’s adherence to Moore’s law from the 1960s to present. All of today’s most advanced artificial intelligence chips, smartphones, autonomous driving systems, and high performance computers contain semiconductors fabricated using EUV lithography.

  • Author(s):
  • John VerWey
  • Share this:
  • Share on Facebook
  • Share on Twitter
  • Share via Email
  • Share on LinkedIn
Tracing the Emergence of Extreme Ultraviolet Lithography
Format:
  • White Paper
Topics:
Website:Visit Publisher Website
Publisher:Center for Security and Emerging Technology
Published:July 1, 2024
License:Creative Commons
Copyright:© 2024 by the Center for Security and Emerging Technology. This work is licensed under a Creative Commons Attribution-Non Commercial 4.0 International License. To view a copy of this license, visit https://creativecommons.org/licenses/by-nc/4.0/.

Featured Content

Contact Publisher

Claim Content